Vapor deposition of diamond and its deposition process.
نویسندگان
چکیده
منابع مشابه
Simulation of morphological instabilities during diamond chemical vapor deposition
The diamond chemical vapor deposition (CVD) process has been investigated theoretically and the morphological instabilities associated with the growth of diamond films have been examined with a model based on the continuum species conservation equation coupled to surface reaction kinetics. A linear stability analysis and numerical calculations have been carried out to determine critical paramet...
متن کاملUnderstanding the chemical vapor deposition of diamond: recent progress.
In this paper we review and provide an overview to the understanding of the chemical vapor deposition (CVD) of diamond materials with a particular focus on the commonly used microwave plasma-activated chemical vapor deposition (MPCVD). The major topics covered are experimental measurements in situ to diamond CVD reactors, and MPCVD in particular, coupled with models of the gas phase chemical an...
متن کاملIntegrated Multi-Scale Modeling of Diamond Chemical Vapor Deposition
The fundamental mechanisms of diamond growth occur on the atomic scale. However, the geometry of the deposition reactor and the other operating parameters directly affect the chemical composition of the gas and the temperature at the growth surface. The properties are in turn controlled by both atomicand microstructural-scale features. By developing diamond growth models at each length scale an...
متن کاملMicrowave Plasma Assisted Chemical Vapor Deposition of Diamond
Diamond crystal S and p01 ycrystal l i ne diamond fi lms have been depos i e y t h e microwave plasma ass i s t ed C V D method from C H / H mixtures. The i n: :oncentration of methane, the pressure, the temperatu$e, 'the to ta l flow ra t e and the microwave power were varied in large ranges. The morphology of the deposits were s tudied by op t i ca l and scanning e l ec t ron microscopy and t...
متن کاملPlasma-enhanced chemical vapor deposition of nanocrystalline diamond
Nanocrystalline diamond films have attracted considerable attention because they have a low coefficient of friction and a low electron emission threshold voltage. In this paper, the author reviews the plasma-enhanced chemical vapor deposition (PE-CVD) of nanocrystalline diamond and mainly focuses on the growth of nanocrystalline diamond by low-pressure PE-CVD. Nanocrystalline diamond particles ...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of the Japan Society of Powder and Powder Metallurgy
سال: 1987
ISSN: 0532-8799,1880-9014
DOI: 10.2497/jjspm.34.395